MicroNanoSystems February/March 2007
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| With the hype surrounding nanotechnology, MEMS and integration of emerging technologies it would be easy to assume that the industry has all the results and processes required to develop a constant supply of life changing devices for the business and consumer world. |
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Advancing E Beam Lithography
E Beam Lithography has always been a precise method of patterning in microelectronics manufacturing but has suffered from slow throughput, reducing its take up in the industry. David Ridsdale spoke to Nezih Unal, VP of Sales and Marketing at GenISys to discover how the process is being developed to meet emerging needs. |
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Customising Photolithography
With the expansion of photolithography machines into new fields, manufacturers of biomedical, solar cell, MEMS and LED products now have a new way to develop next generation devices. Here Neutronix discusses its technology field innovation with its new photolithography mask aligner productuction tool remanufactured from the old industry Canon series. |
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The future of parametric testing
Integrated circuit devices continue to shrink in size, increase in density, and improve in performance every year. Manufacturing and testing these devices while simultaneously maintaining and improving yield has become increasingly difficult. David Ridsdale spoke to Dr. Stewart Wilson, European System Sales Manager for Parametric Test Systems at Agilent about the growing need for parametric testing in the industry. |
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Static & Dynamic MEMS Device characterisation
MEMS are quickly pervading every aspect of the technical world but only a handful are making the grade as commercially viable products. The very diversity creates manufacturing differences that makes it difficult to create a wide variety of devices. In this article, Eleonora Ferraris and Irene Fassi from Institute of Industrial Technology and Automation, Biagio De Masi from MEMS Business Unit, STMicroelectronics, Richard Rosing and Andrew Richardson from Centre for Microsystems Engineering, Lancaster University discuss two empirical methods suitable for the static and the dynamic characterisation of micrometersized structures. |
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